| 摘要 |
<P>PROBLEM TO BE SOLVED: To calculates an effective light source within a short time without performing any timeconsuming calculation of image formation. <P>SOLUTION: A method of calculating a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus comprises steps of: determining an impulse response function of the projection optical system through a process of performing Fourier transform on a pupil function of the projection optical system; setting a length to a second zero point of the impulse response function from the origin as a response length, extracting, from elements forming a target pattern to be formed on the substrate, only elements inside an area within radius which is response length, and determining a function indicating the extracted pattern as an image function; and obtaining the light intensity distribution to be formed on the pupil plane of the illumination optical system based on the pupil function, the determined impulse response function, and the determined image function. <P>COPYRIGHT: (C)2011,JPO&INPIT |
