发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
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申请公布号 |
US2011159441(A1) |
申请公布日期 |
2011.06.30 |
申请号 |
US201113044325 |
申请日期 |
2011.03.09 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LIEBREGTS PAULUS MARTINUS MARIA;WILHELMUS JACOBS JOHANNES HENRICUS;UITTERDIJK TAMMO |
分类号 |
G03F7/20;G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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