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发明名称
GLUCONIC ACID CONTAINING PHOTORESIST CLEANING COMPOSITION FOR MULTI-METAL DEVICE PROCESSING
摘要
申请公布号
IL212374(D0)
申请公布日期
2011.06.30
申请号
IL20110212374
申请日期
2011.04.14
申请人
AVANTOR PERFORMANCE MATERIALS, INC.;INAOKA, SEIJI
发明人
分类号
C11D
主分类号
C11D
代理机构
代理人
主权项
地址
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