| 摘要 |
An etching apparatus includes: an etching space including a chamber; a chuck in the chamber and on which a transparent object to be etched can be loaded; a light source configured to irradiate light onto the object to be etched in order to detect a degree of etching of the object to be etched; and a detector configured to detect an intensity of the light having transmitted through the object to be etched after being emitted from the light source.
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