发明名称 DEVICE AND METHOD FOR FORMING THIN FILM PATTERN
摘要 The present invention provides device and method for forming a thin film pattern which can maintain an extent of wetting of a printing liquid at a proper state without time dependence. The device for forming a thin film includes a printing liquid supply unit for supplying printing liquid, a cliché having a depressed pattern and a relieved pattern for patterning the printing liquid, a printing roller for having the printing liquid supplied from the printing liquid supply unit thereto coated thereon and being rolled on the cliché and the substrate, and a solvent supply unit for supplying a solvent to the printing liquid before the printing liquid coated on the printing roller is brought into contact with the cliché.
申请公布号 US2011155004(A1) 申请公布日期 2011.06.30
申请号 US20100912470 申请日期 2010.10.26
申请人 NAM SEUNG-HEE;MOON TAE-HYOUNG 发明人 NAM SEUNG-HEE;MOON TAE-HYOUNG
分类号 B41K1/22;B41F33/00 主分类号 B41K1/22
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