PHOTOACTIVE RESIN COMPOSITION FOR INSULATION LAYER

摘要

PURPOSE: A photoresist resin composition and an insulating layer manufactured therefrom are provided to enable a water-base develop the composition in an alkali water solution, and to apply both photoactive compound and photo-initiator. CONSTITUTION: A photoresist resin composition contains the following: a first siloxane resin containing an organic silane agent 1 monomer marked with chemical formula 1, and an organic silane agent 2 monomer marked with chemical formula 2; a second siloxane resin obtained by polymerizing the organic silane agent 2 monomer; a photoresist; and an organic solvent.