| 摘要 |
PURPOSE: A half-tone mask for a fine pattern is provided to embody a fine line width of a pixel by comprising supplementary half-tone pattern areas along a shading pattern line. CONSTITUTION: Shading pattern lines(110) forms transfer patterns formed on a transparent substrate. Supplementary half-tone pattern areas(120) are formed on each side of the shading pattern lines. A first supplementary pattern is placed close to the side of the shading pattern lines. A second supplementary pattern is formed on the transparent substrate. The second supplementary pattern is formed along the vertical direction of the first supplementary pattern. |
