发明名称 |
SILICON CARBIDE SUBSTRATE |
摘要 |
Disclosed is a silicon carbide substrate (1) that can be prevented from warping even in cases where a different material layer, which is formed from a material other than silicon carbide, is formed thereon. The silicon carbide substrate (1) comprises a base layer (10) that is formed from silicon carbide, and a plurality of SiC layers (20) that are formed from single crystal silicon carbide and aligned on the base layer (10) when viewed in plan. A gap (60) is provided between the end faces (20B) of SiC layers (20) that are adjacent to each other.
|
申请公布号 |
CA2776403(A1) |
申请公布日期 |
2011.06.30 |
申请号 |
CA20102776403 |
申请日期 |
2010.09.28 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
INOUE, HIROKI;HARADA, SHIN;SASAKI, SHIN;NISHIGUCHI, TARO;OKITA, KYOKO;NAMIKAWA, YASUO |
分类号 |
H01L21/02;C30B29/36;H01L21/336;H01L29/12;H01L29/78 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|