LOW K PRECURSORS PROVIDING SUPERIOR INTEGRATION ATTRIBUTES

摘要

PURPOSE: A low K precursor with excellent integration properties is provided to provide a porous organic-silica glass film with high carbon contents. CONSTITUTION: A low K precursor with excellent integration properties is composed as follows. A base material is prepared inside a vacuum chamber. A gaseous reagent with one or more precursors and porogen precursors is added to the vacuum chamber. A pre-film is with porogen is attached on the base material by applying energy to the gaseous reagent. A porous organic-silica glass film is prepared by eliminating a part of organic material from the pre-film using UV light.