METHOD OF MANUFACTURING INTEGRATED CIRCUIT, AND SUBSTRATE WITH INTEGRATED CIRCUIT FORMED BY THE METHOD OF MANUFACTURING INTEGRATED CIRCUIT,申请号EP20010921998-传众专利搜索

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发明名称	METHOD OF MANUFACTURING INTEGRATED CIRCUIT, AND SUBSTRATE WITH INTEGRATED CIRCUIT FORMED BY THE METHOD OF MANUFACTURING INTEGRATED CIRCUIT
摘要
申请公布号	EP1280193(B1)	申请公布日期	2011.06.29
申请号	EP20010921998	申请日期	2001.04.23
申请人	JGC CATALYSTS AND CHEMICALS LTD.	发明人	TONAI, ATSUSHI;HIRAI, TOSHIHARU;KOYANAGI, TSUGUO;MATSUDA, MASAYUKI;KOMATSU, MICHIO
分类号	H01L21/288;H01L21/768	主分类号	H01L21/288
代理机构		代理人
主权项
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