LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]
申请公布号
SG171645(A1)
申请公布日期
2011.06.29
申请号
SG20110031119
申请日期
2006.04.03
申请人
ASML NETHERLANDS B.V.
发明人
BECKERS, MARCEL;DONDERS, SJOERD NICOLAAS LAMBERTUS;HOOGENDAM, CHRISTIAAN ALEXANDER;JACOBS, JOHANNES HENRICUS WILHELMUS;TEN KATE, NICOLAAS;KEMPER, NICOLAAS RUDOLF;MIGCHELBRINK, FERDY;EVERS, ELMAR
