发明名称 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND DISPLAY SUBSTRATE USING THE THIN FILM TRANSISTOR
摘要 PURPOSE: A thin film transistor, a method for manufacturing the same, and a display board using the same are provided to improve the characteristic by preventing an oxide semiconductor layer to external light. CONSTITUTION: A protective layer(60) is formed on an oxide semiconductor layer(40) to be overlapped with the channel region of the oxide semiconductor layer. An opaque layer is formed between the oxide semiconductor layer and the protective layer. A source electrode is in contact with one side of the oxide semiconductor layer. A drain electrode(80) is in contact with another side of the oxide semiconductor layer to face to the source electrode through the channel region. A gate electrode applies electric field to the oxide semiconductor layer. A gate insulating layer is formed between the gate electrode and the oxide semiconductor layer.
申请公布号 KR20110072808(A) 申请公布日期 2011.06.29
申请号 KR20090129888 申请日期 2009.12.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, DO HYUN;JEONG, KI HUN;LEE, DONG HOON;YOON, KAP SOO;CHOI, JAE HO;YANG, SUNG HOON;YUN, PIL SANG;SEO, SEUNG MI
分类号 H01L29/786 主分类号 H01L29/786
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