发明名称 |
DUAL CATHODIC-ARC SOURCE FOR PLASMA COATING |
摘要 |
PURPOSE: A double cathodic-arc source for plasma coating is provided to improve a plasma coating speed using arc discharge and suppress droplet formed on the surface of a coating film by increasing plasma density. CONSTITUTION: A double cathodic-arc source(100) for plasma coating includes a main induction pipe(110), and first and second sub induction pipes(130,140). The first and second sub induction pipes are arranged symmetrically at a predetermined angle on the main induction pipe. One end of the first and second sub induction pipes is integrally connected with the main induction pipe. An air gun(120) is attached to the other end of the first and second sub induction pipes. The arc gun evaporates an arc target to generate a coating material composed of ions and electrons. The main induction pipe and each sub induction pipe comprise a plurality of electromagnets(150) which electrically control the magnetic field.
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申请公布号 |
KR20110072676(A) |
申请公布日期 |
2011.06.29 |
申请号 |
KR20090129708 |
申请日期 |
2009.12.23 |
申请人 |
RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY |
发明人 |
LEE, KYUNG HWANG;PARK, JONG WON;JEONG, JAE IN;PARK, KWANG SOO |
分类号 |
C23C14/46 |
主分类号 |
C23C14/46 |
代理机构 |
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主权项 |
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