发明名称 Method and apparatus for chalcogenide device formation
摘要 Chalcogenide devices are delineated and sidewalls of the devices are sealed, in an anaerobic and/or anhydrous environment environment. Throughout the delineation and sealing steps, and any intervening steps, the sidewalls are not exposed to oxygen or water. In an illustrative embodiment, a cluster tool includes an etching tool and a sealing/deposition tool configured to etch and seal the chalcogenide devices and to maintain the devices in an anaerobic and/or anhydrous environment throughout the process.
申请公布号 US7967994(B2) 申请公布日期 2011.06.28
申请号 US20070977520 申请日期 2007.10.25
申请人 OVONYX, INC. 发明人 LOWREY TYLER;OVSHINSKY STANFORD R.
分类号 C03C25/68 主分类号 C03C25/68
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