发明名称 |
Environmental system including a transport region for an immersion lithography apparatus |
摘要 |
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
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申请公布号 |
US7969552(B2) |
申请公布日期 |
2011.06.28 |
申请号 |
US20070819689 |
申请日期 |
2007.06.28 |
申请人 |
NIKON CORPORATION |
发明人 |
NOVAK W. THOMAS;HAZELTON ANDREW J.;WATSON DOUGLAS C. |
分类号 |
G03B27/42;G03F;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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