发明名称 |
Fabricating method of thin film transistor array substrate |
摘要 |
A fabricating method of a TFT array substrate includes following steps: providing a substrate having a pixel region and a bonding pad region surrounding the pixel region; forming a patterned polysilicon layer within the pixel region on the substrate; forming a first patterned insulating layer to cover the patterned polysilicon layer; forming a first patterned transparent conductive layer on the first patterned insulating layer; forming a first metal layer on the first patterned transparent conductive layer; forming a second patterned insulating layer to cover the first metal layer; forming a second patterned transparent conductive layer on the second patterned insulating layer; forming a second metal layer on the second patterned transparent conductive layer; forming a third patterned insulating layer to cover the second metal layer; and forming a third patterned transparent conductive layer on the third patterned insulating layer.
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申请公布号 |
US7968367(B2) |
申请公布日期 |
2011.06.28 |
申请号 |
US20100854914 |
申请日期 |
2010.08.12 |
申请人 |
CHUNGHWA PICTURE TUBES, LTD. |
发明人 |
CHIEN YAO-HONG;WANG CHIH-CHIEH;LIU XUAN-YU;CHEN LI-SHAN |
分类号 |
H01L21/00;H01L21/8238;H01L21/84 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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