发明名称 Determining endpoint in a substrate process
摘要 An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.
申请公布号 US7969581(B2) 申请公布日期 2011.06.28
申请号 US20100898672 申请日期 2010.10.05
申请人 APPLIED MATERIALS, INC. 发明人 LIAN LEI;DAVIS MATTHEW FENTON
分类号 G01B11/02;G01B11/06;H01J37/32 主分类号 G01B11/02
代理机构 代理人
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