发明名称 |
Determining endpoint in a substrate process |
摘要 |
An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.
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申请公布号 |
US7969581(B2) |
申请公布日期 |
2011.06.28 |
申请号 |
US20100898672 |
申请日期 |
2010.10.05 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LIAN LEI;DAVIS MATTHEW FENTON |
分类号 |
G01B11/02;G01B11/06;H01J37/32 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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