发明名称 |
Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device |
摘要 |
A manufacturing apparatus for a semiconductor device, includes: a reaction chamber to which a wafer w is loaded; a gas supply port for supplying first process gas including source gas from an upper portion of the reaction chamber; a first rectifying plate for supplying the first process gas onto the wafer in a rectifying state; a first gas exhaust port for exhausting gas from a lower portion of the reaction chamber; a second gas exhaust port for exhausting gas from the upper portion of the reaction chamber; a heater for heating the wafer w; a susceptor for retaining the wafer w; and a rotation drive unit for rotating the wafer w.
|
申请公布号 |
US7967912(B2) |
申请公布日期 |
2011.06.28 |
申请号 |
US20080324578 |
申请日期 |
2008.11.26 |
申请人 |
NUFLARE TECHNOLOGY, INC. |
发明人 |
YAJIMA MASAYOSHI;SUZUKI KUNIHIKO |
分类号 |
C23C16/455;C23C16/458;C23C16/54 |
主分类号 |
C23C16/455 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|