MEASURING DEVICE AND METHOD FOR OXIDE ETCHING RATE OF STEEL MATERIALS

摘要

PURPOSE: A device and method for measuring the oxide film etching rate of a steel material are provided to monitor the change amount of oxygen concentration by the light emitting spectrum of plasma in real time, thereby easily checking the etching rate of a steel material. CONSTITUTION: Plasma(7) is generated around a steel material(3) passing a chamber(1). The light emitting spectrum of the plasma is detected. The strength of the spectrum is compared with the strength of a specific peak wavelength of oxygen. A magnetic field is formed around the steel material to collect the plasma.