LASER PROCESSING APPARATUS HAVING LASER BEAM PROFILER

摘要

PURPOSE: A laser processing apparatus equipped with a laser beam profiler is provided to measure a beam profile in the longitudinal direction of laser irradiated in the form of a line so as to achieve thermal treatment uniformity and improve measurement accuracy. CONSTITUTION: A laser processing apparatus equipped with a laser beam profiler comprises a laser irradiation apparatus, a substrate support(40) and a beam profiler(130). The laser irradiation apparatus irradiates a line-shape laser beam having a length in a direction parallel with a substrate to the substrate. The substrate support is movable in the horizontal direction along the longitudinal direction of the laser beam. The beam profiler arranged opposite to the line of the laser. The beam profiler is installed at the side of the substrate support. The beam profiler is moved with the substrate support in the horizontal direction and measures a beam profile in the longitudinal direction of the laser beam.