METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A LITHOGRAPHIC APPARATUS, DATA PROCESSING APPARATUS, AND COMPUTER PROGRAM PRODUCT

摘要

PURPOSE: A method for measuring properties of dynamic positioning errors in a lithographic apparatus, a data processing apparatus, and a computer program product are provided to accurately measure the variability of MSD(Moving Standard Deviation) which influences CD uniformity. CONSTITUTION: A lighting system adjusts a radiation beam(B). A support structure supports a patterning device. The support structure is connected to a first location determining device to accurately position the patterning device. A substrate table(WT) maintains a substrate(W). A projecting system(PS) projects a pattern assigned to the radiation beam onto a target area of the substrate.