METHOD OF COOLING PROCESS FOR SILICON SINGLE CRYSTAL
摘要
PURPOSE: A cooling process method of a silicon single crystal is provided to reduce or eliminate the thermal stress in a silicon single crystal, thereby preventing cracks during a crop process and a sawing process. CONSTITUTION: A heater for growing a single crystal is powered on after a tail process. The power of the heater decreases. The cooling speed of the silicon single crystal is controlled. The power of the heater decreases at least three times. The decreasing amount of power is set by 10~30kW.
申请公布号
KR20110069947(A)
申请公布日期
2011.06.24
申请号
KR20090126552
申请日期
2009.12.18
申请人
LG SILTRON INCORPORATED
发明人
KIM, DO YEON;MOON, JI HUN;KIM, BONG WOO;CHOI, IL SOO;LEE, SANG HOON;AHN, JIN WOO