PATTERNING METHOD FOR NANO-STRUCTURE

摘要

PURPOSE: A nanostructure patterning method is provided to give hybrid functions of collecting and dehumidifying water to a surface of a substrate by combining a colloidal lithography and a printing technique or a tape masking technique and by arraying nanostructures to a specific location. CONSTITUTION: The nanostructure patterning method includes following steps.(a) The colloidal particle single-layer film is coated in the surface of the substrate.(b) Except a pattern section of the substrate, the rest of surface is masked.(c) The masked substrate is etched and the nanostructures are formed in the pattern part. And(d) the masking formed on the substrate is eliminated. The step(a) is operated by more than one method selected among a spin-coating, a dip-coating, a lifting up, an electrophoretic deposition, a chemical or electrochemical deposition and an electrospray.