BEAM POSITIONING IN MICROLITHOGRAPHY WRITING

摘要

PROBLEM TO BE SOLVED: To provide a system for improving the time efficiency of laser scanning, and the control of a deflector, for microlithography writing and inspection on photosensitive substrates.

SOLUTION: This system is equipped with: at least one sensor for measuring the extent of substrate offset in the direction of deflection; a means for modifying the position data or feeding of the same to correspond to laterally moving scans; and a control unit for controlling read-out of the data for the deflector in dependence of the offset measured by the detector to compensate the offset.

COPYRIGHT: (C)2011,JPO&INPIT