| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of suppressing the occurrence of contamination by a foreign matter or metal and continuously operating for a long period of time. SOLUTION: The plasma treatment apparatus includes a treatment chamber evacuated to given pressure, a suction device 2 which is placed in the treatment chamber and has an electrostatic chuck that sucks and holds a sample by electrostatic charges, a temperature adjusting means which adjusts the temperature of the suction device, a heat-transfer gas supply means which supplies a heat-transfer gas between the suction device and the sample placed on the suction device, and a means which generates plasma in the treatment chamber. The plasma treatment apparatus subjects the sample placed on the suction device to plasma treatment using the generated plasma. The plasma treatment apparatus also includes a ring-shaped protective cover 118 protecting an outer peripheral portion of a sample bearing surface of the suction device, the outer peripheral portion being lower than the sample bearing surface. The cover has a V-shaped overhang 401 formed at its ring-shaped inner periphery which is fitted in a cutout 400 formed at the outer periphery of a suction surface of the electrostatic chuck across a gap. COPYRIGHT: (C)2011,JPO&INPIT |
