SUBSTRATE FOR DEFORMATION MEASUREMENT, EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To easily measure information related to the deformation of an exposure region on a substrate without degrading operation efficiency.

SOLUTION: The substrate for deformation measurement includes: deformation measurement devices G, respectively arranged in a plurality of irradiation regions SA on a substrate B to be subjected to irradiation processing of exposure light, for measuring information related to deformation in the respective irradiation regions; and second deformation measurement devices G2 for measuring information related to deformation of the substrate due to temperature independently of the deformation measurement devices, wherein the deformation measurement devices and the second deformation measurement devices are patterned and formed by irradiation processing of exposure light.

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