发明名称 NANO-IMPRINT PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a pattern forming method which can obtain a pattern with a superior shape. SOLUTION: The pattern forming method includes a process (1) for applying a composition containing a resin and a solvent on a substrate, a process (2) in which the solvent is removed from a layer applied on the substrate to form a composition layer, a process (3) in which while the composition layer is immersed in water, the pattern surface of a mold is pressed on the composition layer to transfer the pattern of the mold, a process (4) for drying the composition layer with the pattern of the mold transferred, and a process (5) for making the obtained composition layer leave the mold. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011121182(A) 申请公布日期 2011.06.23
申请号 JP20090278347 申请日期 2009.12.08
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;YAMADA AIRI;NANBA KATSUHIKO
分类号 B29C59/02;B29K25/00;C08F12/00;H01L21/027 主分类号 B29C59/02
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