发明名称 FIELD-EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an FET capable of switching operation of a high breakdown voltage and a high current and facilitating manufacture. SOLUTION: The field effect transistor includes a first conductive source region (1) positioned on a main surface of a semiconductor of thin body, a first conductive channel region (10), a second conductive defined region (5) to define the channel region, a first conductive drain region (3) located on the other main surface, a first conductive drift region (4) being continuous in a direction of thickness. The concentration of impurity of the drift region (4) and channel region (10) is less than the concentration of impurity of the source region (1), drain region (3), and defined region (5), and the concentration of impurity of the channel region (10) is less than the drift region (4). COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011124597(A) 申请公布日期 2011.06.23
申请号 JP20110019860 申请日期 2011.02.01
申请人 SUMITOMO ELECTRIC IND LTD;MATSUNAMI HIROYUKI;KIMOTO TSUNENOBU 发明人 HARADA MAKOTO;HIROTSU KENICHI;MATSUNAMI HIROYUKI;KIMOTO TSUNENOBU
分类号 H01L29/80;H01L21/337;H01L29/808 主分类号 H01L29/80
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