发明名称 Substrate media distortion analysis
摘要 Embodiments described herein are directed to detecting and/or measuring distortions of substrate media that can occur during a printing process. The distortion can be detected and/or measured using a composite image generated from a reference image having a first periodic pattern and print image, disposed on a test substrate media, having a second periodic pattern. The first and second periodic patterns are specified so that the composite image includes a moiré pattern having moiré fringes resulting from interference between the first periodic pattern associated with the reference image and the second periodic pattern associated with the print image. The moiré fringes can be used to detect and calculate an amount of distortion of the test substrate media.
申请公布号 US2011150347(A1) 申请公布日期 2011.06.23
申请号 US20090655216 申请日期 2009.12.23
申请人 XEROX CORPORATION 发明人 WANG SHEN-GE;XU BEILEI;LOCE ROBERT P.
分类号 G06K9/68 主分类号 G06K9/68
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