PHOTOLITHOGRAPHIC METHOD AND MASK DEVICES UTILIZED FOR MULTIPLE EXPOSURES IN THE FIELD OF A FEATURE

摘要

A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tf that is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tc that is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.