METHOD FOR FORMING A SELECTIVE EMITTER FOR A SOLAR CELL

摘要

The method for forming a selective emitter for a solar cell according to the present invention comprises the steps of: preparing a crystalline silicon substrate of a first conductive type; forming a low-density ion implantation layer of a second conductive type in the substrate; forming a high-density semiconductor layer by irradiating a laser onto the surface of the substrate in a location where a front electrode is to be formed, and so activating impurity ions in the low-density ion implantation layer of the second conductive type; and forming a semiconductor layer of the second conductive type by subjecting the substrate to a heat treatment and so activating the low-density ion implantation layer of the second conductive type.