发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SAME
摘要 <p>Disclosed is a semiconductor device having an element formation region (1A) wherein an element is formed on a semiconductor wafer (1), and a scribe region (3) formed on the periphery of the element formation region (1A) on the semiconductor wafer (1). Furthermore, the semiconductor device has a protective film (2) which is formed on and protects the element formation region (1A) and the scribe region (3).</p>
申请公布号 WO2011074155(A1) 申请公布日期 2011.06.23
申请号 WO2010JP04730 申请日期 2010.07.23
申请人 PANASONIC CORPORATION;HIRANO, HIROSHIGE;ITOU, FUMITO;OTA, YUKITOSHI;KOIKE, KOJI 发明人 HIRANO, HIROSHIGE;ITOU, FUMITO;OTA, YUKITOSHI;KOIKE, KOJI
分类号 H01L21/304;H01L21/301;H01L21/312 主分类号 H01L21/304
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