摘要 |
<P>PROBLEM TO BE SOLVED: To reduce interruptions in an exposure process by successfully recognizing an image of an alignment mark with high probability. <P>SOLUTION: An image signal output from each image obtaining device is subjected to an image recognition under a first determination condition to detect the position of the recognized alignment mark. When image recognition fails under the first determination condition, the image recognition is carried out under second a determination condition which are looser than the first determination condition, to detect the position of the recognized alignment mark. A mask holder 20 and a chuck 10 are relatively moved based on the position of the alignment mark 2a of a mask 2 and the position of the alignment mark 1a of a substrate 1 detected by the image recognition under the second determination condition, to correct misalignment between the mask 2 and the substrate 1. Then, the image signal output from each image obtaining device is subjected to an image recognition process under first determination condition to detect the position of the recognized alignment mark, and the mask 2 and the substrate 1 are aligned. <P>COPYRIGHT: (C)2011,JPO&INPIT |