| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing occurrence of an exposure failure. <P>SOLUTION: This exposure apparatus exposes a substrate with exposure light through liquid. The exposure apparatus includes: an optical member having an emission surface for emitting exposure light and formed with an immersion space on the emission surface side; and a movable member capable of forming an immersion space between the emission surface and itself, and having an upper surface including a first region of a hydrophilic property with respect to liquid in the immersion space. When a non-liquid-contact state where the liquid in the first region and that in the immersion space do not contact each other runs beyond a first period in a non-exposure period of the substrate, the exposure apparatus forms an immersion space between the emission surface and the first region to change the non-liquid-contact state into a liquid-contact state where the liquid in the first region and that in the immersion space contact each other. <P>COPYRIGHT: (C)2011,JPO&INPIT |
