GAS BARRIER FILM, METHOD FOR PRODUCING GAS BARRIER FILM, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT

摘要

Disclosed is a gas barrier film which has both high gas barrier performance and high cracking (bending) resistance. Specifically disclosed is a gas barrier film which comprises, on a base in the following order, at least one silanol-containing layer and at least one gas barrier layer that contains silicon atoms and hydrogen atoms. The gas barrier film is characterized in that the relative SiOH ion intensity in the central part of the silanol-containing layer in the film thickness direction as detected by time-of-flight secondary ion mass spectrometry (Tof-SIMS) is 0.02-1.0 when the relative Si ion intensity is taken as 1. Also disclosed is an organic photoelectric conversion element which comprises the gas barrier film.