| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation sensitive resin composition superior in line width roughness (LWR), depth of focus (DOP) and pattern profile, so as to more stably form a high-precision minute pattern for manufacturing a highly integrated high-precision electronic device, and to provide a method of forming a pattern using the same. <P>SOLUTION: The method of forming a pattern includes: a step of applying the actinic-ray- or radiation sensitive resin composition on a substrate so as to form a film; a step of selectively exposing the film through a mask; and a step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation sensitive resin composition contains: a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased; a photoacid generator (B) that, when exposed to actinic rays or radiation, generates an acid containing a fluorine atom; and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8-20 mass% based on the total solids of the composition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
