发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD |
摘要 |
A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.
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申请公布号 |
US2011151378(A1) |
申请公布日期 |
2011.06.23 |
申请号 |
US20100949790 |
申请日期 |
2010.11.19 |
申请人 |
JSR CORPORATION |
发明人 |
MATSUMURA NOBUJI;SOYANO AKIMASA;ASANO YUUSUKE;NARUOKA TAKEHIKO;SAKAKIBARA HIROKAZU;SHIMIZU MAKOTO;NISHIMURA YUKIO |
分类号 |
G03F7/004;C08F220/22;C08F220/28;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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