PHOTOMASK BLANK, AND PROCESS FOR PRODUCTION OF PHOTOMASK

摘要

A photomask blank comprising: a light-shielding film (13) that contains chromium, cannot be etched substantially by a fluorine-based dry etching process, and can be etched by an oxygen-containing chlorine-based dry etching process; and a film (14) that does not contain chromium, can be etched by both a fluorine-based dry etching process and an oxygen-containing chlorine-based dry etching process, and is laminated on the light-shielding film (13).