| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an emitter capable of operating at a high extraction voltage in a charged particle beam device and moreover having improved emittance, to provide a manufacturing method thereof, and to provide a charged particle beam device equipped with the above emitter. <P>SOLUTION: A rare gas is introduced around an emitter 1, a prescribed extraction voltage of 9 kV or higher is impressed between the emitter 1 and an extraction electrode 29 and the extraction voltage is kept constant, and while an emission pattern from the emitter 1 is observed, an etching gas is introduced for etching a tip end of the emitter 1, and as soon as the emission pattern, while being etched, shows a spot of a trimer or a monomer by constitutive atoms of the emitter and the size and strength of the spot become larger than the other constitutive atoms, the introduction of the etching gas is stopped. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
