ORTHO-NITROBENZYL ESTER COMPOUND AND POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME

摘要

PURPOSE: A positive type photosensitive resin composition including an ortho-nitrobenzyl ester compound is provided to ensure excellent sensitivity, resolution, pattern formation capablity and residue removal proeprty. CONSTITUTION: An ortho-nitrobenzyl ester compound includes a compound represented by chemical formula 1, a compound represented by chemical formula 2, or combination thereof. In chemical formulas 1 and 2, R1, R2, R5 and R6 are the same and different and represent substituted or unsubstituted aliphatic organic group or substituted or unsubstituted alicyclic organic group; R3 and R7 are the same and different and represent a single bond, or substituted or unsubstituted divalent organic group; R4, R8 and R9 are the same and different and represent substituted or unsubstituted aliphatic organic group or substituted or unsubstituted alicyclic organic group; n1 is an integer of 1-5; n2 is an integer of 0-3; n3 is an integer of 0-4; and n2+n3 is an integer of 1 or greater.