发明名称 TRANSISTORS WITH A DIELECTRIC CHANNEL DEPLETION LAYER AND RELATED FABRICATION METHODS
摘要 A metal-insulator-semiconductor field-effect transistor (MISFET) includes a semiconductor layer with source and drain regions of a first conductivity type spaced apart therein. A channel region of a first conductivity type extends between the source and drain regions. A gate contact is on the channel region. A dielectric channel depletion layer is between the gate contact and the channel region. The dielectric channel depletion layer provides a net charge having the same polarity as the first conductivity type charge carriers, and which may deplete the first conductivity type charge carriers from an adjacent portion of the channel region when no voltage is applied to the gate contact.
申请公布号 US2011147764(A1) 申请公布日期 2011.06.23
申请号 US20090612499 申请日期 2009.11.04
申请人 CREE, INC.;NORTH CAROLINA STATE UNIVERSITY 发明人 DHAR SARIT;RYU SEI-HYUNG;MISRA VEENA;LICHTENWALNER DANIEL J.
分类号 H01L29/78;H01L21/265;H01L21/28 主分类号 H01L29/78
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