| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a resist pattern having few defects, an excellent shape, and excellent line edge roughness. <P>SOLUTION: There is disclosed a salt represented by formula (I). In the formula, Q<SP>1</SP>and Q<SP>2</SP>each represent F or a perfluoroalkyl group; L<SP>1</SP>represents a single bond or a divalent saturated hydrocarbon group that may contain a substituent, provided that -CH<SB>2</SB>- thereof may be substituted with -O- or -CO-; Y<SP>1</SP>represents a (m+1)-valent saturated cyclic hydrocarbon group, provided that -CH<SB>2</SB>- thereof may be substituted with -O-, -CO-, or -SO<SB>2</SB>-; X<SP>1</SP>represents an aliphatic hydrocarbon group, provided that at least one of hydrogen atoms contained therein is substituted with a fluorine atom and one or more of hydrogen atoms contained therein may be substituted with a hydroxy group; m represents an integer of 1 or 2; and Z<SP>+</SP>represents an organic counter ion. <P>COPYRIGHT: (C)2011,JPO&INPIT |
