发明名称 METHOD OF MANUFACTURING ACTUATOR APPARATUS, METHOD OF MANUFACTURING LIQUID JET HEAD, AND METHOD OF MANUFACTURING LIQUID JET APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To obtain a method of manufacturing an actuator apparatus having stable displacement characteristics and suppressing reduction of reliability, and to obtain a method of manufacturing a liquid jet head having the actuator apparatus, and a method of manufacturing a liquid jet apparatus having the liquid jet head. <P>SOLUTION: Although a first piezoelectric layer 71 on a vibration plate 52 is removed at a step of a photolithography etching process with remaining a region where a lower electrode 60 is formed, a second piezoelectric layer 72 containing lead zirconate titanate having a thickness equal to or more than 4 nm and equal to or less than 20 nm is formed over the first piezoelectric layer 71, the lower electrode 60, and the vibration plate 52 after the photolithography etching process. Since the second piezoelectric layer 72 contains the same lead zirconate titanate as a third piezoelectric layer 73 formed on the first piezoelectric layer 71 and the second piezoelectric layer 72 formed on the lower electrode 60, a composition unstable phase can be made hard to be generated in the vicinity of an interface between the first piezoelectric layer 71 and the second piezoelectric layer 72 and in the vicinity of an interface between the second piezoelectric layer 72 and the third piezoelectric layer 73. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011124405(A) 申请公布日期 2011.06.23
申请号 JP20090281295 申请日期 2009.12.11
申请人 SEIKO EPSON CORP 发明人 RI KINZAN
分类号 B41J2/055;B41J2/045;B41J2/135;B41J2/14;B41J2/16;H01L41/09;H01L41/18;H01L41/22;H01L41/29;H01L41/316;H01L41/318;H01L41/319;H01L41/332;H01L41/39 主分类号 B41J2/055
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