| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a gas barrier film which has excellent gas barrier properties and transparency, and the gas barrier film. SOLUTION: The method for producing a gas barrier film includes: a base material preparation step of preparing a base material; and a gas barrier layer formation step of forming a gas barrier layer containing silicon oxynitride formed on the base material, wherein the formation of the gas barrier layer in the gas barrier layer formation step is performed using an ion plating process with a sublimation gas including a xenon gas. In the gas barrier film, the gas barrier layer has a composition composed of, by atom,≤42% Si,≥31% N,≤27% O and≤2% C (wherein, the total of the respective contents of Si, N, O and C is controlled to 100 atomic%). COPYRIGHT: (C)2011,JPO&INPIT
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