发明名称 |
AN APPARATUS AND A METHOD AND A SYSTEM FOR TREATING A SURFACE WITH AT LEAST ONE GLIDING ARC SOURCE |
摘要 |
<p>The invention relates to an apparatus for treating a surface with a at least one gliding arc source comprising at least one gas flow controlling unit (104); and a set of electrodes (102); wherein the at least one gas flow controlling unit (104) and the set of electrodes (102) are controlled to provide a plasma comprising a gas temperature at the set of electrodes (102) above approximately 2000 K. In this way, an optimal or substantially optimal plasma for treating surfaces of samples is achieved.</p> |
申请公布号 |
WO2011073170(A1) |
申请公布日期 |
2011.06.23 |
申请号 |
WO2010EP69587 |
申请日期 |
2010.12.14 |
申请人 |
DANMARKS TEKNISKE UNIVERSITET;KUSANO, YUKIHIRO |
发明人 |
KUSANO, YUKIHIRO |
分类号 |
H05H1/24;H05H1/48 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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