发明名称 AN APPARATUS AND A METHOD AND A SYSTEM FOR TREATING A SURFACE WITH AT LEAST ONE GLIDING ARC SOURCE
摘要 <p>The invention relates to an apparatus for treating a surface with a at least one gliding arc source comprising at least one gas flow controlling unit (104); and a set of electrodes (102); wherein the at least one gas flow controlling unit (104) and the set of electrodes (102) are controlled to provide a plasma comprising a gas temperature at the set of electrodes (102) above approximately 2000 K. In this way, an optimal or substantially optimal plasma for treating surfaces of samples is achieved.</p>
申请公布号 WO2011073170(A1) 申请公布日期 2011.06.23
申请号 WO2010EP69587 申请日期 2010.12.14
申请人 DANMARKS TEKNISKE UNIVERSITET;KUSANO, YUKIHIRO 发明人 KUSANO, YUKIHIRO
分类号 H05H1/24;H05H1/48 主分类号 H05H1/24
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