发明名称 GRAPHITE CRUCIBLE AND APPARATUS FOR PRODUCING SILICON SINGLE CRYSTAL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a graphite crucible which is used for producing a silicon single crystal by a Czochralski method and has long service life. <P>SOLUTION: The graphite crucible includes a degassing hole provided in the corner part of the crucible. A gas generated by the reaction between a quartz crucible and the graphite crucible is released to the outside through the degassing hole to prevent formation of SiC on the surface of the graphite crucible and to prevent deformation of the quartz crucible by gas pressure. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011121827(A) 申请公布日期 2011.06.23
申请号 JP20090281808 申请日期 2009.12.11
申请人 SILTRONIC JAPAN CORP 发明人 KATO HIDEO;MURAKAMI HIDEAKI;SUEHIRO MIKIO
分类号 C30B29/06;C30B15/10 主分类号 C30B29/06
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