| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus constitution capable of general inspection even though it has a minimum scale since reductions in the apparatus volume has been required in terms of cost while high accuracy and the large-diameter formation of wafers have been required, data to be processed has been increased by functionality enhancement (such as a multi-sensor) of inspection year by year, a ratio of a signal processor to the apparatus volume has increased, and evaluation inspection work at the time when the apparatus is started has increased by functionality enhancement in a surface inspection apparatus. SOLUTION: By separating a processing function detector by the detector, a signal processor not required for general inspection can be removed. A signal processor provided with an evaluation function used for parameter determination work can be connected. COPYRIGHT: (C)2011,JPO&INPIT |
