发明名称 |
SEMICONDUCTOR DEVICE INCLUDING CONDUCTIVE LINES WITH FINE LINE WIDTH AND METHOD OF FABRICATING THE SAME |
摘要 |
A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.
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申请公布号 |
US2011147800(A1) |
申请公布日期 |
2011.06.23 |
申请号 |
US201113014952 |
申请日期 |
2011.01.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SEO HYEOUNG-WON;ROH BYUNG-HYUG;KIM SEONG-GOO;JEON SANG-MIN |
分类号 |
H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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