发明名称 SEMICONDUCTOR DEVICE INCLUDING CONDUCTIVE LINES WITH FINE LINE WIDTH AND METHOD OF FABRICATING THE SAME
摘要 A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.
申请公布号 US2011147800(A1) 申请公布日期 2011.06.23
申请号 US201113014952 申请日期 2011.01.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEO HYEOUNG-WON;ROH BYUNG-HYUG;KIM SEONG-GOO;JEON SANG-MIN
分类号 H01L27/10 主分类号 H01L27/10
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