发明名称 METHOD AND APPARATUS FOR HIGH EFFICIENCY GAS DISSOCIATION IN INDUCTIVE COUPLED PLASMA REACTOR
摘要 Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present invention provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.
申请公布号 WO2011037757(A3) 申请公布日期 2011.06.23
申请号 WO2010US48269 申请日期 2010.09.09
申请人 APPLIED MATERIALS, INC.;NANGOY, ROY, C.;SINGH, SARAVJEET;FARR, JON, C.;PAMARTHY, SHARMA, V.;KUMAR, AJAY 发明人 NANGOY, ROY, C.;SINGH, SARAVJEET;FARR, JON, C.;PAMARTHY, SHARMA, V.;KUMAR, AJAY
分类号 H01L21/3065 主分类号 H01L21/3065
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