| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus, which shortens time required for exchanging a substrate, and improves the productivity. <P>SOLUTION: A collision between a substrate held by an elevating member and a conveyance arm, and a collision between the elevating member during the elevating operation and the substrate held by the conveyance arm, are avoided by a predetermined interval (a) in an XY plane of a substrate stage and the conveyance arm. A controller determines whether the substrate stage which has started to move toward a second position reaches a fourth position that shifts to a front side from the second position by the predetermined interval (a), when the elevating operation by the elevating member, which has started to deliver the substrate to and from the conveyance arm, ends. If the controller determines that the substrate stage does not reach the fourth position, the controller controls the movement of the substrate stage, the elevation of the elevating member and the movement of the conveyance arm, so that the conveyance arm starts to move toward the second position before the end of the elevating operation by the elevating member. <P>COPYRIGHT: (C)2011,JPO&INPIT |
